1.照相平版印刷术
1.the process of creating lithographs using photographic methods
2.the process of producing integrated circuits and printed circuit boards by photographing the circuit pattern on a photosensitive substrate and then chemically etching away the background
1.One of the procedures used in making monolithic integrated circuits which overcomes this problem is photolithography based on photoresists.
规程的当中一个被使用在做整体集成电路克服这个问题是石版影印根据光致抗蚀剂。
2.that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring.
测试晶圆片-影印过程中用于颗粒计算、量溶解度和检测金属污染的晶圆片。
3.One embodiment of the present invention provides techniques and systems for determining modeling parameters for a photolithography process.
一种用于为光刻工艺确定参数的方法，所述方法包括：接收布局；
4.Transmission phase gratings with continuous relief structures are fabricated with one step direct laser writing grayscale photolithography.
利用一步激光直写灰阶光刻方法制作了具有连续浮雕结构的透射式相位光栅。
5.The beam pision method in maskless laser interference photolithography can be pided into wave-front pision and amplitude pision.
无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。
6.Contact-mode photolithography was used for realizing the monolithic integration of 0.
采用光学接触式光刻方式，实现了单片集成0。
7.Alignment Precision - Displacement of patterns that occurs during the photolithography process.
套准精度-在光刻工艺中转移图形的精度。
8.The principle for eliminating the diffraction error of photolithography with lens array is demonstrated by optical transfer function method.
用光学传递函数方法说明了透镜阵列消除光刻中衍射误差的原理。
9.Influences of side-wall slope of photolithography pattern on characteristic dimensions after ion implantation are analyzed.
分析了光刻图形侧墙斜坡对离子注入后图形特征尺寸的影响。
10.A first photolithography process forms first and second diffusion trench openings for the first and second diffusion regions.
第一光刻工艺为第一和第二扩散区形成了第一和第二扩散沟槽开口。